In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 106 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical finesse up to 50000 has been observed.
Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications
BAWAJ, MATEUSZ;DI GIUSEPPE, Giovanni;KRALJ, NENAD;MALOSSI, Nicola;NATALI, Riccardo;ROSSI, MASSIMILIANO;VITALI, David;
2016-01-01
Abstract
In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 106 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical finesse up to 50000 has been observed.File in questo prodotto:
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Serra et al.-AIP Advances, 2016 vol. 6, art. 065004.pdf
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