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EnglishPrecise low-frequency internal friction measurements on vitreous silica, taken over a wide temperature (4K < T < 300 K) and frequency range (40 Hz < nu < 14 kHz), show remarkable similarities, but also suggestive differences with recent light scattering experiments. In the interval 30K < T < 110 K, the exponent alpha of the power law relaxational spectrum turns out to be proportional to T-T(k), with a minimum at around T(k) = 13K. This phenomenon is interpreted as a manifestation of thermal activation in an asymmetric double well system, the asymmetry being associated to quenched spatial disorder. For T > 160K the loss angle develops a distinct step-like structure followed by a plateau, both independent of nu, thus signalling the onset of a competing relaxation mechanism with much higher an activation energy. Copyright (C) EPLA, 2007.
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| Titolo: | Low-frequency internal friction in silica glass | |
| Autori: | ||
| Data di pubblicazione: | 2007 | |
| Rivista: | ||
| Abstract: | Precise low-frequency internal friction measurements on vitreous silica, taken over a wide temperature (4K < T < 300 K) and frequency range (40 Hz < nu < 14 kHz), show remarkable similarities, but also suggestive differences with recent light scattering experiments. In the interval 30K < T < 110 K, the exponent alpha of the power law relaxational spectrum turns out to be proportional to T-T(k), with a minimum at around T(k) = 13K. This phenomenon is interpreted as a manifestation of thermal activation in an asymmetric double well system, the asymmetry being associated to quenched spatial disorder. For T > 160K the loss angle develops a distinct step-like structure followed by a plateau, both independent of nu, thus signalling the onset of a competing relaxation mechanism with much higher an activation energy. Copyright (C) EPLA, 2007. | |
| Handle: | http://hdl.handle.net/11581/224102 | |
| Appare nelle tipologie: | Articolo |
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